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Elfo Mist Jetting

High-pressure air type dry films resist developing equipment

EDeveloping  with the slit nozzle because of the high-pressure mist.

 We adopted the slit nozzle design because of minimum developer liquid use with mist condition and high efficiency by high pressure air.

EThe jetting pressure, optionally adjustable design

Optional setting mechanism for developer pressure and the jetted high-pressure air by using the pneumatic pressure regulator and high pressurized developer.

EProcessing parameter adjustable  thru touch panel

Processing conditions of the nozzle movement range, the speed, and the jetting pressure etc. of the screen version developing equipment can be arbitrarily set from the touch panel.

ECollection and recycling design mechanism for the developer mist

The mist jetted by negative pressure of the blower are collected because mist jetting, it pressurizes again, and the developer is jetted from the slit nozzle.


EWB-2AR


Development accuracy level

ESandblasting finish film

A) Developing patternFƒΣ‚R‚UƒΚmilayer thickness ‚T‚OƒΚmj

B) Developing patternFƒΣ‚R‚OƒΚmilayer thickness‚T‚OƒΚmj

C) Developing patternFWidth‚U‚OƒΚmilayer thickness‚P‚O‚OƒΚmj

D) Developing patternFƒΣ‚W‚OƒΚmilayer thickness‚P‚O‚OƒΚmj


EEtching dry film resist 

A) Developing patternFWidth‚WƒΚm@ilayer thickness ‚Q‚TƒΚmj

BjDeveloping patternFWidth‚Q‚TƒΚmilayer thickness ‚W‚OƒΚmj

 
EWB-1ST

High-pressure type screen developing equipment

ELarge size slit nozzle design

The small quantity of water is made the mist from the large-scale slit nozzle for mist jetting by using high-pressure air and a microscopic pattern is developed with the developing equipment while accelerating the mist of water.

EEnable large-scale screen printing, 1050 mm x 1050 mm

A large-size screen printing on the substrate, 1050mm~1050mm@with high accuracy .

EA  microscopic pattern development  thick photo resist film

A microscopic pattern can be made up even in the thick film make-up.The high-pressure mist are possible of the make-up of a microscopic pattern with the high-pressure air type screen version developing equipment w/ No swelling of the emulsion of the spraying thick layer.

EThe minimum the developing water Consumption less than 1/10 water consumption compared with the others

Because the small quantity of water is made to the mist and jetted, the quantity consumed of water can be decreased to 1/10 or less compared with conventional developing equipment for microscopic screen printing developer.

EProcessing parameter adjustable  thru touch panel

Processing conditions of the nozzle movement range, the speed, and the jetting pressure etc. of the screen version developing equipment can be arbitrarily set from the touch panel. 


Large-scale screen version development equipment


EWB-4ARSC


Consultation of device and processing


TEL:052-758-1102@@FAX:052-758-1103
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